What are the processing difficulties of granite bases for semiconductor equipment?
The surface micro-quality of semiconductor equipment granite bases, characterized by nanoscale roughness, zero micro-defects, ultra-high cleanliness, non-magnetic and contamination-free properties, and uniform micro-morphology, directly determines wafer yield and long-term equipment stability. I. Surface Roughness (Core Indicator)Working Surfaces (Benchmarks / Guides / Vacuum Surfaces): Ra ≤ 0.01–0.05 μm (10–50 nm); High-end lithography machines / inspection platforms…
