Day: 07/17/2026

Core Advantages of Semiconductor Lithography Machine Granite Bases I. Ultimate Thermal Stability, Eliminating Nan-Scale Thermal Drift (Core Requirement for Lithography)The dedicated semiconductor granite has an extremely low coefficient of thermal expansion, only 1/4 of steel and 1/ of aluminum alloy. Under minute temperature fluctuations, its deformation is minimal, preventing lithography overlay offset and pattern misalignment,…

Full Solution for Granite Semiconductor Lithography Machine BaseI. Solution OverviewThis solution is designed for EUV extreme ultraviolet lithography machines, ArF immersion lithography machines, and KrF lithography equipment. It utilizes a semiconductor-grade 000-level high-density diabase (Jinan Green / Indian Black) integrated granite base, paired with precision structural design, multi-stage aging processes, active vibration isolation, and an…